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Photoelectron spectroscopy studies of chemical vapor deposition of Ta from a TaF₅ precursor on Si and SiO₂ subtratesUGOLINI, D; KOWALCZYK, S. P; MCFEELY, F. R et al.Journal of applied physics. 1991, Vol 70, Num 7, pp 3899-3906, issn 0021-8979Article

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Low-temperature selective-area deposition of metals : chemical vapor deposition of gold from ethyl(trimethylphosphine)gold(I)BANASZAK HOLL, M. M; SEIDLER, P. F; KOWALCZYK, S. P et al.Applied physics letters. 1993, Vol 62, Num 13, pp 1475-1477, issn 0003-6951Article

Photochemical etching during ultraviolet photolytic deposition of metal films on semiconductor surfaces = Attaque photochimique pendant le dépôt photolytique en ultraviolet de couches minces métalliques sur des surfaces de semiconducteursKOWALCZYK, S. P; MILLER, D. L.Journal of applied physics. 1986, Vol 59, Num 1, pp 287-289, issn 0021-8979Article

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